Title of article
Electrical properties of chemical solution deposited (Bi0.9RE0.1)(Fe0.975Cu0.025)O3−δ (RE=Ho and Tb) thin films
Author/Authors
Jin Won Kim، نويسنده , , Chinanmbedu Murugesan Raghavan، نويسنده , , Youn-Jang Kim، نويسنده , , Jeong-Jung Oak، نويسنده , , Hae Jin Kim، نويسنده , , Won-Jeong Kim، نويسنده , , Myong-Ho Kim، نويسنده , , Tae Kwon Song، نويسنده , , Sang Su Kim، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2013
Pages
5
From page
189
To page
193
Abstract
Pure BiFeO3 (BFO) and (Bi0.9RE0.1)(Fe0.975Cu0.025)O3−δ (RE=Ho and Tb, denoted by BHFCu and BTFCu) thin films were prepared on Pt(111)/Ti/SiO2/Si(100) substrates by using a chemical solution deposition method. The BHFCu and BTFCu thin films showed improved electrical and ferroelectric properties compared to pure BFO thin film. Among them, the BTFCu thin film exhibited large remnant polarization (2Pr), low coercive field (2Ec) and reduced leakage current density, which are 89.15 C/cm2 and 345 kV/cm at 1000 kV/cm and 5.38×10−5 A/cm2 at 100 kV/cm, respectively.
Keywords
C. Electrical properties , C. Ferroelectric properties , A. Films
Journal title
Ceramics International
Serial Year
2013
Journal title
Ceramics International
Record number
1276952
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