• Title of article

    Al thermomigration applied to the formation of deep junctions for power device insulation

  • Author/Authors

    Dilhac، J-M. نويسنده , , Cornibert، L. نويسنده , , Ganibal، C. نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 1999
  • Pages
    -22
  • From page
    23
  • To page
    0
  • Abstract
    An alternative method for creating total vertical junction insulation of power devices is presented. It involves the thermomigration of melted Al/Si. The method is first theoretically presented together with the specifically designed rapid thermal processor used in the experiments. Physical and electrical results are then given showing the efficiency of the method in terms of thermal budget, surface consumption and voltage handling capability. The issue of manufacturability is finally addressed.
  • Keywords
    Form error , Roundness , tolerance , Circlilarity , Min-Max
  • Journal title
    MICROELECTRONICS RELIABILITY
  • Serial Year
    1999
  • Journal title
    MICROELECTRONICS RELIABILITY
  • Record number

    12827