Title of article :
Advanced failure detection techniques in deep submicron CMOS integrated circuits
Author/Authors :
Rubio، Antonio نويسنده , , Altet، Josep نويسنده , , Mateo، Diego نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 1999
Abstract :
The test of present integrated circuits exhibits many confining aspects, among them the adequate selection of the observable variables, the use of combined testing approaches, an each time more restricted controllability and observability (physically and electrically) and finally the required testing time. In the paper these points are discussed and different nowadays-promising techniques exposed. Complementarily to the logic output variable analysis (both value and delay) three efficient detection and localisation techniques can be considered that are contemplated in this work: the detection of light, heat and leakage currents due to the presence of failures. In most of the cases it is not possible to differentiate clearly, like was in the past, the production testing, the in-field testing, the test and the localisation of the failure, making each time closer the fields of testing and failure analysis. © 1999 Elsevier Science Ltd. All rights reserved.
Keywords :
Electromigration , Microstructural analysis , Aluminum alloys , Resistance measurements
Journal title :
MICROELECTRONICS RELIABILITY
Journal title :
MICROELECTRONICS RELIABILITY