Title of article :
Cross-section analysis of electric devices by scanning capacitance microscope
Author/Authors :
Takasaki، Yoichi نويسنده , , Yamamoto، Takuma نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 1999
Abstract :
Carrier influence of semiconductor devices is important as it affects the function of the device. In this experiment, the carrier density distribution in the cross-section of semiconductor device was analyzed by SCM: Scanning Capacitance Microscope which is one of the measuring mode of SPM: Scanning Probe Microscope. This paper describe measurement result of change in carrier density by the gate voltage at p channel area of CMOS device and its efficiency to investigating dopant profile on 16MDRAM cross-section. © 1999 Published by Elsevier Science Ltd. All rights reserved.
Keywords :
Electromigration , Microstructural analysis , Aluminum alloys , Resistance measurements
Journal title :
MICROELECTRONICS RELIABILITY
Journal title :
MICROELECTRONICS RELIABILITY