Title of article :
FIB Voltage Contrast Measurement for Enhanced Circuit Repairs
Author/Authors :
Desplats، Romain نويسنده , , Benteo، Bruno نويسنده , , Perdu، Philippe نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 1999
Pages :
-1002
From page :
1003
To page :
0
Abstract :
Recent planar technologies with 3 metal layers or more challenge current physical design modification capacities using Focused Ion Beam tools. Image visibility on the FIB is drastically reduced, making accurate positioning and milling operations in the area of interest more difficult. Despite the complexity of FIB modifications, however, the demand for circuit modifications continues to increase. We will present a method which brings voltage contrast measurement capabilities to FIB systems. With this method, it is possible to verify the completion of FIB repairs. © 1999 Elsevier Science Ltd. All rights reserved.
Keywords :
Electromigration , Microstructural analysis , Aluminum alloys , Resistance measurements
Journal title :
MICROELECTRONICS RELIABILITY
Serial Year :
1999
Journal title :
MICROELECTRONICS RELIABILITY
Record number :
13071
Link To Document :
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