Title of article
Contact Resistance Anomalies of Vias before Breakdown in Accelerated Current Life Tests
Author/Authors
Golz، W.L.F. نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 1999
Pages
-1108
From page
1109
To page
0
Abstract
To test a new method for reliability assessment a two via test structure was designed including standard 4-point contact pads for current supply and voltage measurement and additional intermediate contact pads allowing observation of voltage drop along lines and vias. Under special conditions the tests showed heavy anomalies of voltage drop between the intermediate contacts which are attributed to void development within the contact layers. © 1999 Elsevier Science Ltd. Ail rights reserved.
Keywords
Electromigration , Microstructural analysis , Resistance measurements , Aluminum alloys
Journal title
MICROELECTRONICS RELIABILITY
Serial Year
1999
Journal title
MICROELECTRONICS RELIABILITY
Record number
13104
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