Title of article
The effects of porous silicon on the crystalline properties of ZnO thin films Original Research Article
Author/Authors
Hong Cai، نويسنده , , Honglie Shen، نويسنده , , Yugang Yin، نويسنده , , Linfeng Lu، نويسنده , , Jiancang Shen، نويسنده , , Zhengxia Tang، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2009
Pages
5
From page
967
To page
971
Abstract
In the present work, ZnO was deposited on porous silicon substrates by sol-gel spin coating and rf magnetron sputtering. The porous silicon (PS) substrates were formed by electrochemical anodization on p-type (1 0 0) silicon wafer, and the starting material for ZnO was Zinc acetate dehydrate. Raman spectroscopy revealed the good quality of the porous silicon substrate. XRD analysis showed that highly (0 0 2) oriented ZnO thin films were formed. SEM, AFM and optical microscope have been used to understand the effects of the substrate on crystalline properties of the samples. The results indicated that the porous silicon substrate is beneficial to improve the crystalline quality in lattice mismatch heteroepitaxy due to its sponge-like structure.
Keywords
C. X-ray diffraction , A. Inorganic compounds , B. Sol–gel growth
Journal title
Journal of Physics and Chemistry of Solids
Serial Year
2009
Journal title
Journal of Physics and Chemistry of Solids
Record number
1310800
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