• Title of article

    The effects of thermal annealing on the obliquely deposited Ag–Ge–S thin films Original Research Article

  • Author/Authors

    F. Wang، نويسنده , , W.P. Dunn، نويسنده , , M. Jain، نويسنده , , Fabio C. De Léo، نويسنده , , N. Vicker، نويسنده , , R. Savage، نويسنده , , X. Jin، نويسنده , , S. Mamedov، نويسنده , , P. Boolchand، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2009
  • Pages
    4
  • From page
    978
  • To page
    981
  • Abstract
    Obliquely deposited thin films of ternary Ag–Ge–S glasses are characterized in this work. Thin films are fabricated in a vacuum thermal evaporator at different evaporation angles and examined by Raman spectroscopy. The Raman mode frequency of GeS4 corner-sharing (CS) structure of the as-deposited films display a red-shift as a function of Ag content due to reduced global connectivity, and therefore decreased network stress. Film thickness of normally deposited thin films is significantly less when compared against obliquely deposited ones. Sulfur-ring (S8) modes are observed in thin films but not in corresponding bulk material. Thermal annealing of thin films results in the disappearance of Sulfur-ring (S8) modes, while the temperature required for this phenomenon is deposition angle dependent. Thickness of the obliquely deposited films shrinks significantly after thermal annealing, which indicates a collapse of the micro-column structure introduced by oblique deposition.
  • Keywords
    B. Vapor deposition , C. Raman spectroscopy , A. Amorphous materials , A. Chalcogenides
  • Journal title
    Journal of Physics and Chemistry of Solids
  • Serial Year
    2009
  • Journal title
    Journal of Physics and Chemistry of Solids
  • Record number

    1310802