An evaluation of fast wafer level test methods for interconnect reliability control

A number of fast wafer level test methods exist for interconnect reliability evaluation. The relative abilities of three such methods to predict the quality and reliability of the interconnect over very short test times are evaluated in this work. Four different test structure designs are also evaluated and the results are compared with package level Median Time to Failure (MTF) results. The Isothermal test method combined with SWEAT-type test structures is shown to be the most suitable combination for interconnect reliability detection and control over very short times. 1999 Elsevier Science Ltd. All rights reserved.