Title of article
Study on the damaging process of silica by in-reactor luminescence
Author/Authors
Ii، نويسنده , , Tatsuya and Yoshida، نويسنده , , Tomoko and Tanabe، نويسنده , , Tetsuo and Hara، نويسنده , , Takanobu and Okada، نويسنده , , Moritami and Yamaguchi، نويسنده , , Kenji، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2000
Pages
5
From page
898
To page
902
Abstract
We have carried out in situ luminescence measurements of silica glasses in a fission reactor. In the in-reactor-luminescence (IRL) spectra, the 300-nm band was observed for all the samples and its intensity stayed constant during irradiation. For low-OH fused silica glass, the 400-nm IRL band was also observed and reduced rapidly with irradiation, while for high-OH fused and synthesized silica glasses, the 450-nm IRL band grew slowly. The comparison with photoluminescence (PL) and electron spin resonance (ESR) spectra showed that the decrease of the 400-nm IRL band reflects the transition of B2β center to E′ center by electron excitation by γ-rays, while the growth of the 450-nm IRL band related to defect formation from neutron irradiation. However, single crystal silica showed only a 300-nm IRL band, suggesting that the damaging processes are influenced by the local structure around defects as well as the OH content in silica.
Journal title
Journal of Nuclear Materials
Serial Year
2000
Journal title
Journal of Nuclear Materials
Record number
1347312
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