Author/Authors :
Ge، نويسنده , , Chang-Chun and Li، نويسنده , , Jiang-Tao and Zhou، نويسنده , , Zhang-Jian and Cao، نويسنده , , Wen-Bin and Shen، نويسنده , , Weiping and Wang، نويسنده , , Ming-Xu and Zhang، نويسنده , , Nian-Man and Liu، نويسنده , , Xiang and Xu، نويسنده , , Zheng-Yu، نويسنده ,
Abstract :
Three different processing technologies are described for the fabrication of SiC/C functionally graded material (FGM), B4C/Cu coating FGM and W/Cu FGM. The microstructure and physical properties of the FGMs are evaluated. Some plasma-relevant performances of these three FGMs show their prospect as plasma-facing materials in fusion reactors.
