Title of article :
Use of UO2 films for electrochemical studies
Author/Authors :
S. and Miserque، نويسنده , , F. and Gouder، نويسنده , , T. and Wegen، نويسنده , , D.H. and Bottomley، نويسنده , , Anthony P.D.W. Ford، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2001
Pages :
11
From page :
280
To page :
290
Abstract :
UO2 films have been prepared by dc reactive sputtering of a uranium metal target in an Ar/O2 atmosphere. We have used the films deposited on gold substrates as working electrodes for electrochemical investigations as simulating the surfaces of fuel pellets. Film composition was determined by photoelectron spectroscopy (XPS and UPS) and X-ray diffraction (XRD). The oxide stoichiometry as a function of deposition conditions was determined and the appropriate conditions for UO2.0 formation established. AC impedance and cyclic voltammetry measurements were performed. A double RC electrical equivalent circuit was used to fit the data from impedance measurements, similar to those used in unirradiated UO2 or spent fuel pellets. However due to the porosity or adhesion defects on the thin films that permitted a direct contact between the solution and the gold substrate, we were obliged to add a contribution simulating the water–gold system. Cyclic voltammetry measurements show the influence of pH on the dissolution mechanism. Alkaline solutions permit the formation of an oxidised layer (UO2.33) which is not present in the acidic solutions. In both pH=2 and pH=6 solutions, a UVI species layer is formed.
Journal title :
Journal of Nuclear Materials
Serial Year :
2001
Journal title :
Journal of Nuclear Materials
Record number :
1355778
Link To Document :
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