Title of article
Studies on the oxidation behavior of niobium-implanted Zircaloy-4 at 500 °C
Author/Authors
Chen، نويسنده , , X.W and Bai، نويسنده , , X.D and Yu، نويسنده , , R.H and Zhou، نويسنده , , Q.G and Chen، نويسنده , , B.S، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2002
Pages
4
From page
190
To page
193
Abstract
The effect of niobium ion implantation on the oxidation behavior of Zircaloy-4 was investigated. It was interesting to find that the oxidation behavior of Zircaloy-4 was deteriorated after niobium ion implantation. Auger electron spectroscopy, X-ray photoemission spectroscopy and glancing angle X-ray diffraction were employed to analyze the depth profile of the element composition, the valence of the oxide scale and the phase of the oxidation products, respectively.
Journal title
Journal of Nuclear Materials
Serial Year
2002
Journal title
Journal of Nuclear Materials
Record number
1356034
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