Author/Authors :
Djourelov، نويسنده , , Nikolay and Marchand، نويسنده , , Benoît and Marinov، نويسنده , , Hristo and Moncoffre، نويسنده , , Nathalie and Pipon، نويسنده , , Yves and Nédélec، نويسنده , , Patrick and Toulhoat، نويسنده , , Nelly and Sillou، نويسنده , , Daniel، نويسنده ,
Abstract :
Doppler broadening of annihilation gamma-line combined with a slow positron beam was used to measure the momentum density distribution of annihilating pair in a set of sintered UO2 samples. The influence of surface polishing, of implantation with 800-keV 136Xe2+ at fluences of 1 × 1015 and 1 × 1016 Xe cm−2, and of annealing were studied by following the changes of the momentum distribution shape by means of S and W parameters. The program used for this purpose was VEPFIT. At the two fluences in the stoichiometric as-implanted UO2, formation of Xe bubbles was not detected. The post-implantation annealing and over-stoichiometry in the as-implanted sample caused Xe precipitation and formation of Xe bubbles.
