Author/Authors :
Debelle، نويسنده , , A. and Barthe، نويسنده , , M.F. and Sauvage، نويسنده , , T. and Belamhawal، نويسنده , , R. and Chelgoum، نويسنده , , A. and Desgardin، نويسنده , , P. and Labrim، نويسنده , , H.، نويسنده ,
Abstract :
The distribution and the nature of 3He implantation-induced defects in polycrystalline tungsten samples were studied by Positron Annihilation Spectroscopy as a function of implantation fluence. The implanted helium profile was determined by Nuclear Reaction Analysis, and its evolution under different thermal annealings was investigated. Results show that vacancy-like defects are generated along the path of the ions and that their concentration varies directly as the implantation fluence. No helium desorption was observed under any thermal treatments. However, a change in 3He depth profile under specific annealing conditions suggests the formation of nanometric-size He bubbles.