Author/Authors :
Kim، نويسنده , , Hyoungil and El-Awady، نويسنده , , Jaafar and Gupta، نويسنده , , Vijay and Ghoniem، نويسنده , , Nasr and Sharafat، نويسنده , , Shahram، نويسنده ,
Abstract :
In the current work, hot isostatic pressing is adopted to deposit tungsten coatings on F82H substrates. The interface strength of the W/F82H samples is measured using the Laser Spallation technique and the microstructure is analyzed to determine the strength of the coating. Finally, the failure mechanisms of the hot isostatic pressing versus vacuum plasma spraying tungsten coatings and their different failure strengths are compared. It is concluded that the hot isostatic pressing process ensures a good adhesion for the W/F82H interface while the vacuum plasma spraying process results in relatively lower failure strength for the W-coating itself due to the high porosity in the coating.