Title of article :
Low frequency Raman scattering of amorphous Ge1−xSx (0⩽x⩽0.62)
Author/Authors :
Ogura، نويسنده , , H and Matsuishi، نويسنده , , K and Onari، نويسنده , , S، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2002
Pages :
5
From page :
973
To page :
977
Abstract :
Amorphous Ge1−xSx (0.0⩽x⩽0.62) films were prepared by a laser ablation method, and their low frequency Raman scattering spectra were measured at 20 K. Two distinct vibration regimes were observed in the spectra. In the regime at higher frequencies, the power-law dependence of the reduced Raman intensity (I∝ωt) changes with an increase in x for x>0.2 in such a way that t increases from 1.4 to 1.7 as x increases from 0.2 to 0.62. By applying a fracton model, the fractal dimension is found to decrease with an increase in x over the range 0.2⩽x⩽0.62.
Journal title :
Journal of Non-Crystalline Solids
Serial Year :
2002
Journal title :
Journal of Non-Crystalline Solids
Record number :
1367563
Link To Document :
بازگشت