Title of article :
Numerical modeling of thermally-stimulated currents for the density-of-states determination in thin-film semiconductors
Author/Authors :
Main، نويسنده , , C. and Souffi، نويسنده , , N. and Reynolds، نويسنده , , S. and Brüggemann، نويسنده , , R.، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2006
Pages :
4
From page :
1028
To page :
1031
Abstract :
The paper reports on thermally stimulated conductivity studies used for characterization of the density of states profile in thin film semiconductors, by numerically solving the non-linear time-dependent rate equations for free and trapped charge. We explore the derivation of energy and density scales from temperature and conductivity data. We examine the distinction between ‘strong’ and ‘weak’ re-trapping and the use of low ‘effective’ values of attempt-to-escape frequencies in establishing an energy scale, and the ad hoc inclusion of a temperature-dependent lifetime. It is confirmed for several illustrative model systems that the technique can afford surprisingly good fidelity in recovery of the density of states under a range of conditions.
Keywords :
Amorphous semiconductors , Silicon , Modeling and simulation , Electrical and electronic properties
Journal title :
Journal of Non-Crystalline Solids
Serial Year :
2006
Journal title :
Journal of Non-Crystalline Solids
Record number :
1372231
Link To Document :
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