Title of article
Atomic layer deposition of TiO2 on mesoporous silica
Author/Authors
Mahurin، نويسنده , , Shannon and Bao، نويسنده , , Lili and Yan، نويسنده , , Wenfu and Liang، نويسنده , , Chengdu and Dai، نويسنده , , Sheng، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2006
Pages
5
From page
3280
To page
3284
Abstract
Ultra-thin layers of titanium dioxide are conformally grown within the pores of an ordered mesoporous silica, SBA-15, using atomic layer deposition, reducing the pore size from the original value of 67 إ to a final value of 32 إ. Analysis of the nitrogen isotherms indicated a conformal growth process in which both the internal surface area of the mesoporous material and the external surface was coated.
Keywords
porosity , Zeolites , Sol–gels (xerogels)
Journal title
Journal of Non-Crystalline Solids
Serial Year
2006
Journal title
Journal of Non-Crystalline Solids
Record number
1379876
Link To Document