Title of article :
Impact of stress on Fowler–Nordheim parameters effects on EEPROM threshold voltage
Author/Authors :
Postel-Pellerin، نويسنده , , J. and Lalande، نويسنده , , F. and Canet، نويسنده , , P. and Boutahar، نويسنده , , S. and Bouchakour، نويسنده , , R. and Pizzuto، نويسنده , , O. and Régnier، نويسنده , , A.، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2007
Pages :
5
From page :
610
To page :
614
Abstract :
In this paper we propose a new way of studying stress effects on non-volatile memory cells. First, Fowler–Nordheim (FN) current will particularly be measured after setting up a new non-stressing I(V) measurement method, using pulse voltage instead of conventional sweep measurements. A comparison with cell array stress test (CAST) measurements will then be made. Secondly, we propose a simulation of the programming window, based on FN parameters extracted from these curves, showing its closure with write/erase (W/E) operations.
Keywords :
Defects , Silicon
Journal title :
Journal of Non-Crystalline Solids
Serial Year :
2007
Journal title :
Journal of Non-Crystalline Solids
Record number :
1380619
Link To Document :
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