• Title of article

    Er-doped SiO2 films by rf magnetron co-sputtering

  • Author/Authors

    Cattaruzza، نويسنده , , E. and Battaglin، نويسنده , , G. and Visentin، نويسنده , , F. and Trave، نويسنده , , E.، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2009
  • Pages
    4
  • From page
    1128
  • To page
    1131
  • Abstract
    The magnetron sputtering assisted by radiofrequency is a versatile technique to obtain glass films doped with rare earths. Er:SiO2 systems are optical materials able to amplify an optical signal at λ = 1.54 μm (the most used wavelength in fiber glass for optical telecommunications). Different energy treatments of these materials were performed, both during and after the sputtering deposition synthesis, with the aim at optimizing the radiative emission. The best-performing Er:SiO2 samples obtained are characterized by a photoluminescence yield comparable to that of the best Er:SiO2 systems obtained by other synthesis techniques.
  • Keywords
    sputtering , silica , Luminescence
  • Journal title
    Journal of Non-Crystalline Solids
  • Serial Year
    2009
  • Journal title
    Journal of Non-Crystalline Solids
  • Record number

    1381713