Structure and electrical properties of nitrided NbN–TiN sol–gel derived films

The results of investigations of electrical conductivity and the structure of NbN–TiN thin films in a different NbN/TiN molar ratio are presented in this work. Sol–gel derived xNb2O5−(100−x)TiO2 coatings (where x = 100, 90, 80, 70, 60, 50, 40, 0 mol%) were nitrided at 1200 °C to obtain NbN–TiN films. The structural transformations occurring in the films as a result of ammonolysis were studied using X-ray diffraction (XRD), atomic force microscopy (AFM) and X-ray photoelectron spectroscopy (XPS). The electrical conductivity was measured with a conventional four-terminal method in the temperature range of 5–280 K. The NbN–TiN samples exhibited a negative temperature coefficient of resistivity. The positive temperature coefficient of resistivity was observed only for the x = 0 sample. The results of conductivity versus temperature may be described on the grounds of a model proposed for a weakly disordered system. The film thickness effect on the superconducting properties was studied for x = 80 and x = 100 samples. The superconducting transition was not observed in all samples, the exception was x = 80 sample, 1050 nm in thickness. It is not clear, why all x = 100 samples do not exhibit superconducting transition in resistivity measurements. It seems to be possible, that the Josephson junction formation between NbN grains could be blocked by non-superconducting phases present in these samples.