Title of article
The kinetics of the light-induced defect creation in hydrogenated amorphous silicon – Stretched exponential relaxation
Author/Authors
Morigaki، نويسنده , , K. and Takeda، نويسنده , , K. and Hikita، نويسنده , , H. and Ogihara، نويسنده , , C. and Roca i Cabarrocas، نويسنده , , P.، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2008
Pages
4
From page
2131
To page
2134
Abstract
Our model for light-induced defect creation in hydrogenated amorphous silicon is applied to its kinetics, i.e., the growing curve of light-induced dangling bond density as a function of illumination time, which is fitted to a stretched exponential function. Two parameters β and τ involved in the function are estimated as functions of saturated dangling bond density in terms of our model. These are compared with two experimental results, i.e., our results obtained from ESR measurements and Shimakawa et al.’s results obtained from photoconductivity measurements. The saturated dangling bond density is also measured as a function of the generation rate of free carriers. The experimental results are compared with calculated results and discussed.
Keywords
Amorphous semiconductors , Silicon , Defects , Luminescence , electron spin resonance
Journal title
Journal of Non-Crystalline Solids
Serial Year
2008
Journal title
Journal of Non-Crystalline Solids
Record number
1382750
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