Title of article
Rapid thermal annealing treatment of ZnO: Al films for photovoltaic applications
Author/Authors
Tang، نويسنده , , Zeguo and Koshino، نويسنده , , Hideto and Sato، نويسنده , , Shunsuke and Shimizu، نويسنده , , Hirokazu and Shirai، نويسنده , , Hajime، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2012
Pages
3
From page
2501
To page
2503
Abstract
We investigated the effect of rapid thermal annealing (RTA) on ZnO: Al (AZO) films prepared at different substrate temperature, the results revealed that the resistivity decreased while crystallinity drastically improved after post annealing treatment. In addition, the amorphous/crystalline silicon heterojunction solar cell was fabricated with AZO films as transparent conductive oxide films. The conversion efficiency of solar cell enhanced significantly after post RTA treatment at 500 °C for 5 min, which due to the improvements of crystallinity, conductivity and transmission of AZO films. The results suggested that RTA treatment was an effective approach to improve the conversion efficiency of heterojunction solar cell.
Keywords
a-Si/c-Si , Heterojunction , AZO films , RTA
Journal title
Journal of Non-Crystalline Solids
Serial Year
2012
Journal title
Journal of Non-Crystalline Solids
Record number
1383742
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