• Title of article

    Rapid thermal annealing treatment of ZnO: Al films for photovoltaic applications

  • Author/Authors

    Tang، نويسنده , , Zeguo and Koshino، نويسنده , , Hideto and Sato، نويسنده , , Shunsuke and Shimizu، نويسنده , , Hirokazu and Shirai، نويسنده , , Hajime، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2012
  • Pages
    3
  • From page
    2501
  • To page
    2503
  • Abstract
    We investigated the effect of rapid thermal annealing (RTA) on ZnO: Al (AZO) films prepared at different substrate temperature, the results revealed that the resistivity decreased while crystallinity drastically improved after post annealing treatment. In addition, the amorphous/crystalline silicon heterojunction solar cell was fabricated with AZO films as transparent conductive oxide films. The conversion efficiency of solar cell enhanced significantly after post RTA treatment at 500 °C for 5 min, which due to the improvements of crystallinity, conductivity and transmission of AZO films. The results suggested that RTA treatment was an effective approach to improve the conversion efficiency of heterojunction solar cell.
  • Keywords
    a-Si/c-Si , Heterojunction , AZO films , RTA
  • Journal title
    Journal of Non-Crystalline Solids
  • Serial Year
    2012
  • Journal title
    Journal of Non-Crystalline Solids
  • Record number

    1383742