Silica Λ-shape wedge arrays fabrication and interspace tuning via hot embossing and sol–gel replication

New-type silica Λ-shape wedge arrays (SWAs) were fabricated by a combined process of template fabrication, hot embossing and sol–gel replication. Using silica needle arrays (SNAs) as template, the configuration of Λ-shape was transferred from SNAs to PMMA/PC molds by hot-pressing process. Then they were casted to form silica Λ-shape wedge arrays by sol–gel process. Using this procedure, high quality silica Λ-shape wedge arrays can be obtained with designed sizes and shapes over a large area. The taper height and interspace of SWAs can be tuned by the imprint depth during the hot-embossing process. This technology provides a cost-effective method to fabricate Λ-shape silica wedges. By changing the primal template, other patterned silica substrate can also be fabricated, such as grating, pillar and spherical structures. These silica based microstructure can find many applications in semiconductor devices, solar cells and optics etc.