Title of article :
193 nm absorption behavior in medium-to-high OH containing fused silica — The role of the initial ODC, OH and H2 contents
Author/Authors :
Mühlig، نويسنده , , Ch. and Bublitz، نويسنده , , S. and Bernitzki، نويسنده , , H.، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2013
Abstract :
In the initial stage of low fluence ArF laser long term irradiation the absorption behavior in medium-to-high OH containing fused silica materials ([OH] = 250…1400 wt-ppm) depends on the OH content as well as on the initial content of oxygen deficiency centers (ODC). The absorption at a particular fluence (1 mJ/cm2) and its change after 193 nm irradiation (20 Mio. Pulses, 5 mJ/cm2) correlate to the OH content whereas the fluence dependent absorption dk/dH(1…3 mJ/cm2) and its change for the same irradiation conditions follow the initial ODC content.
more narrow range of the OH content ([OH] ≥ 1000 wt-ppm) both, the absorption at a particular fluence and the fluence dependent absorption are correlated to the initial amount of molecular hydrogen in the fused silica.
Keywords :
Fused silica , Molecular hydrogen , Hydroxyl group , oxygen deficiency , ArF laser absorption
Journal title :
Journal of Non-Crystalline Solids
Journal title :
Journal of Non-Crystalline Solids