Investigation on the O3 sensitivity properties of WO3 thin films prepared by sol–gel, thermal evaporation and r.f. sputtering techniques

WO3 thin films have been deposited on alumina substrates provided with platinum interdigital electrodes by sol–gel (SG), r.f. sputtering (RFS), and vacuum thermal evaporation (VTE) techniques and annealed at temperatures between 500°C and 600°C for 1 to 30 h in static air. The morphology, crystalline phase and chemical composition of the films have been characterised using SEM, glancing XRD and XPS techniques. The electrical response has been measured exposing the films to O3 (10–180 ppb), NO2 (0.2–1 ppm), NOx (27 ppm NO and 1 ppm NO2) at different operating temperatures ranging between 200 and 400°C and humid air at 50% R.H. SG prepared films have shown bigger responses (S=IAir/Igas) with respect to VTE and RFS for all the investigated gases and operating temperatures. RFS prepared has resulted to be less sensitive, but faster in the response and more stable in terms of signal reproducibility. The response to O3 has been found to be at maximum at 400°C. At this temperature the response to 80 ppb of ozone has been: S=35 (SG), S=18 (VTE) and S=5 (RFS). The NO2 and NOx response reached the maximum at 200°C and becomes negligible at 400°C. Improvements on the O3 gas sensitivity and selectivity can be achieved by fixing the operating temperature of the films at 400°C.