Title of article :
A study of silicon Schottky diode structures for NOx gas detection
Author/Authors :
Zhang، نويسنده , , Wenyi and de Vasconcelos، نويسنده , , Elder A. and Uchida، نويسنده , , H. and Katsube، نويسنده , , T. and Nakatsubo، نويسنده , , T. and Nishioka، نويسنده , , Y.، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2000
Abstract :
A silicon Schottky diode structure was applied for detecting nitride oxide gases at room temperature. The Pt–Pd/Si/Al structure was employed successfully to detect NO2 gas concentration for as low as 6 ppm at room temperature. This sensor also showed useful response to NO gas, but the sensitivity was lower than its sensitivity to NO2 gas. Fabrication of the diode on a porous silicon surface enhances NO2 gas sensitivity, but the response time becomes longer. This structure provides a convenient technique to manufacture miniaturized and integrated sensors.
Keywords :
Porous silicon , NOx gas sensor , Silicon Schottky diode
Journal title :
Sensors and Actuators B: Chemical
Journal title :
Sensors and Actuators B: Chemical