Simulation of Ta2O5-gate ISFET temperature characteristics

The simulated response of an ion-sensitive field-effect transistor (ISFET) with a tantalum pentoxide-gate (Ta2O5-gate) insulator is introduced in this paper. This simulation is based on the site-binding model and is designed for an ISFET working in a constant charge mode. Here, the temperature characteristics of Ta2O5-gate ISFET were theoretically studied. First, the Stern Electrical Double Layer Model was used to induce the pKa and pKb of Ta2O5 values. Secondly, the temperature coefficient was calculated to draw the related curve of the different temperature parameters using the pKa and pKb values and the ISFET behaviors. ISFETs were predicted under different temperatures.