Gas sensing properties of thin film (≤3 μm) Cr2−xTixO3 (CTO) prepared by atmospheric pressure chemical vapour deposition (APCVD), compared with that prepared by thick film screen-printing

We show how the microstructure of different Cr2−xTixO3 gas sensors (x = 0.05; 0.2) affects the response to CO and EtOH. The response variation to varying concentrations of target gas is explained by a simple three-elements resistor network. Cr2−xTixO3 sensors of different microstructures were prepared by a variety of routes; namely, screen-printing, APCVD and flame fusion.