Title of article :
Effect of CH4/H2 plasma ratio on ultra-low friction of nano-crystalline diamond coating deposited by MPECVD technique
Author/Authors :
Sharma، نويسنده , , Neha and Kumar، نويسنده , , N. and Sundaravel، نويسنده , , B. S. Panda، نويسنده , , Kalpataru and David، نويسنده , , Wang and Kamarrudin، نويسنده , , Karim M. El-Dash ، نويسنده , , S. and Panigrahi، نويسنده , , B.K. and Tyagi، نويسنده , , A.K. and Lin، نويسنده , , I-Nan and Raj، نويسنده , , Baldev، نويسنده ,
Issue Information :
ماهنامه با شماره پیاپی سال 2011
Pages :
7
From page :
980
To page :
986
Abstract :
Nano-crystalline diamond coatings were deposited on the silicon substrate using Microwave Plasma Enhanced Chemical Vapor Deposition (MPECVD). Experiments were performed by varying the H2 content in CH4/H2 plasma during synthesis. Raman spectral analysis revealed that with decrease in hydrogen content in the CH4 plasma, the ID/IG ratio decreases with the formation of smaller crystallites. Such a film possesses a large grain boundary fraction containing hydrogenated amorphous carbon (a-C:H). During tribological test, sufficient amount of hydrogen present in the grain boundary passivates the dangling σ-bond causing ultra-low friction and extremely low wear evident by improvement in microstructure.
Keywords :
Nano-crystalline diamond , Dangling bonds , Coefficient of friction
Journal title :
Tribology International
Serial Year :
2011
Journal title :
Tribology International
Record number :
1426434
Link To Document :
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