Author/Authors :
Zolotaryov، نويسنده , , A. and Bachmann، نويسنده , , J. and Montero-Moreno، نويسنده , , J.M. and Pitzschel، نويسنده , , K. and Nielsch، نويسنده , , K.، نويسنده ,
Abstract :
We show that covering the water-saturated MgO surface with an Al2O3 film using atomic layer deposition and then annealing it at 400 °C leads to plastic deformation of alumina by trapped water vapor with consequent development of hollow structures. This phenomenon is applied to thin films, nanopatterned surfaces and isolated 3D nanostructures.
Keywords :
atomic layer deposition , Lithography , Hollow nanostructures , Heat treatment
