Author/Authors :
N and Feitknecht، نويسنده , , L and Kluth، نويسنده , , O and Ziegler، نويسنده , , Y and Niquille، نويسنده , , X and Torres، نويسنده , , P and Meier، نويسنده , , J and Wyrsch، نويسنده , , N and Shah، نويسنده , , A، نويسنده ,
Abstract :
In the present paper, we report on thin-film microcrystalline silicon solar cells grown at high deposition rates on back-reflectors with optimised light-scattering capabilities. A single-junction solar cell with a conversion efficiency of η=7.8% (2 μm thickness) was fabricated at a deposition rate of 7.4 Å/s. Another microcrystalline cell was successfully implemented in a “micromorph” tandem (i.e. a microcrystalline/amorphous tandem cell with n–i–p–n–i–p configuration); the resulting initial conversion efficiency was η=11.2%. A 4 μm thick single-junction cell at a deposition rate of 10 Å/s and with a conversion efficiency of η=6.9% was fabricated on a non-optimised substrate. Special attention is drawn to near-infrared spectral response and interface optimisation.
Keywords :
microcrystalline silicon , High deposition rate , Thin-film n-i-p solar cell , VHF-GD