Title of article
Generation of interstitial boron by minority-carrier injection
Author/Authors
Ohshita، نويسنده , , Yoshio and Vu، نويسنده , , Tuong Khanh and Yamaguchi، نويسنده , , Masafumi، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2003
Pages
5
From page
405
To page
409
Abstract
The performance of boron-doped CZ Si solar cell is degraded by the light irradiation and/or the minority carrier (electron) injection. To understand these phenomena, ab initio molecular orbital calculations are carried out using a cluster model. The theoretical results indicate that the activation energy for kicking out a substitutional B by the interstitial Si is decreased due to the injected electron. Therefore, the interstitial B is easily produced by the minority carrier injection and then diffuses in the Si crystal, resulting in the generation of the interstitial B and interstitial O defect complex.
Keywords
B–O defect , Light degradation
Journal title
Solar Energy Materials and Solar Cells
Serial Year
2003
Journal title
Solar Energy Materials and Solar Cells
Record number
1478441
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