• Title of article

    Generation of interstitial boron by minority-carrier injection

  • Author/Authors

    Ohshita، نويسنده , , Yoshio and Vu، نويسنده , , Tuong Khanh and Yamaguchi، نويسنده , , Masafumi، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2003
  • Pages
    5
  • From page
    405
  • To page
    409
  • Abstract
    The performance of boron-doped CZ Si solar cell is degraded by the light irradiation and/or the minority carrier (electron) injection. To understand these phenomena, ab initio molecular orbital calculations are carried out using a cluster model. The theoretical results indicate that the activation energy for kicking out a substitutional B by the interstitial Si is decreased due to the injected electron. Therefore, the interstitial B is easily produced by the minority carrier injection and then diffuses in the Si crystal, resulting in the generation of the interstitial B and interstitial O defect complex.
  • Keywords
    B–O defect , Light degradation
  • Journal title
    Solar Energy Materials and Solar Cells
  • Serial Year
    2003
  • Journal title
    Solar Energy Materials and Solar Cells
  • Record number

    1478441