Stress in photochromic and electrochromic effects on tungsten oxide film

Optical absorbance at 632.8 nm and the stress generated in tungsten oxide film due to photochromic and electrochromic effects were measured. WO3 thin films were deposited by reactive sputtering and the absorbance was obtained by measuring the optical transmittance of a laser beam through the film. The stress was calculated by measuring the substrate curvature and using the Stoney equation for multilayered films, since two layers are deposited onto a substrate for the electrochromism studies. The optical absorbance and the stress in the tungsten oxide film, as a function of UV irradiation time in photochromism and of inserted charge in electrochromism, are showed and discussed. In both effects the stresses generated were rendered as due to cation insertions into the film: H+ protons in photochromism and Li+ ions in electrochromism. The accuracy of the Stoney equation used for the stress calculation was also discussed.