Title of article
Effect of Ar plasma treatment on the photo-electrical properties of nanocrystal TiO2 films
Author/Authors
Han، نويسنده , , Jun-Bo and Wang، نويسنده , , Nian and Yu، نويسنده , , Guo-Ping and Wei، نويسنده , , Chuguang Zheng and Lixing Zhou، نويسنده , , Zhengguo and Wang، نويسنده , , Qu-Quan، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2005
Pages
7
From page
293
To page
299
Abstract
Nanocrystal TiO2 films were prepared by radio frequency (RF) sputtering technique and coating method, respectively. The samples were treated by Ar RF plasma. The crystal structure, absorption spectra and morphology of the TiO2 films were investigated by X-ray diffraction (XRD), UV–VIS spectrophotometry and atomic force microscopy (AFM). The voltages and photo-currents of the TiO2 electrodes were also measured. By Ar plasma treatment, the photo-currents of the sputtered and coated TiO2 electrodes increased by 80% and 60%, respectively.
Keywords
Photo-electrical properties , Ar plasma treatment , Nanocrystal TiO2 films , Coating method , Radio frequency sputtering
Journal title
Solar Energy Materials and Solar Cells
Serial Year
2005
Journal title
Solar Energy Materials and Solar Cells
Record number
1479944
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