Author/Authors :
Vernardou، نويسنده , , D. and Paterakis، نويسنده , , P. and Drosos، نويسنده , , H. and Spanakis، نويسنده , , E. and Povey، نويسنده , , I.M. and Pemble، نويسنده , , M.E. and Koudoumas، نويسنده , , E. and Katsarakis، نويسنده , , N.، نويسنده ,
Abstract :
Thin films of vanadium oxide were deposited on glass substrates at 450 oC by atmospheric pressure chemical vapour deposition. The effect of the vanadium tetrachloride to water precursor ratio on the structural and morphological properties of the films was investigated. The water concentration was observed to strongly affect the vanadium oxidation state and the morphological characteristics of the films. The importance of achieving single-phase of a particular oxidation state towards the improvement of the electrochemical performance of thin films grown by atmospheric pressure CVD is highlighted.
Keywords :
Vanadium oxides , Atmospheric pressure chemical vapour deposition , Cyclic voltammetry , Electrochemical properties , Electrochromics
