Modelling deposit growth on tilted rotating cylindrical substrate in centrifugal spray deposition

Centrifugal spray deposition (CSD) using a tilted rotating cylindrical substrate may offer considerable technical benefits over the conventional CSD process using a reciprocating substrate in producing ring preforms. A model has been developed to calculate the deposit growth rate as a function of the liquid volume flowrate, the substrate radius, the tilt angle, the position of the atomising disc, and the longitudinal position at the substrate. The deposit band length is determined by the substrate radius and tilt angle. The distribution of the deposit growth rate is symmetrical provided the atomising disc is positioned on the substrate axis or displaced along the direction perpendicular to the tilt plane. For a tilt angle of < 50-46°, the deposit thickness uniformity can be improved by increasing the displacement. A tapered deposit with a controlled gradient can be obtained if the atomising disc is positioned offcentre on the tilt plane.