Title of article :
New fluoropolymer materials
Author/Authors :
Wood، نويسنده , , Colin D. and Michel، نويسنده , , Udo and Rolland، نويسنده , , Jason P. and DeSimone، نويسنده , , Joseph M.، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2004
Abstract :
We report the synthesis of two classes of fluoropolymers that could impact several key lithographic techniques; one has potential applications in next generation photolithography (193 nm, 157 nm, and immersion lithography) and the other in lithographic techniques which are emerging as viable alternatives to photolithography for future applications (i.e., soft lithography).
Keywords :
NM , 157 , NM , Photoresists , Immersion lithography , Supercritical fluids , Microfluidics , Soft lithography , Dielectrics , NANOTECHNOLOGY , Lithography , 193
Journal title :
Journal of Fluorine Chemistry
Journal title :
Journal of Fluorine Chemistry
