Title of article :
Effects of acid treatment on activated carbon used as a support for Rb and K catalyst for C2F5I synthesis and its mechanism
Author/Authors :
Mao، نويسنده , , Aiqin and Wang، نويسنده , , Hua and Tan، نويسنده , , Linhua and Nin، نويسنده , , Xiangyang and Pan، نويسنده , , Renming، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2011
Pages :
6
From page :
548
To page :
553
Abstract :
In the present work, the activated carbon (AC) support was treated with HCl, HNO3 and HF solution. The order of catalyst dispersion was as follows: Rb–K/AC–HNO3 > Rb–K/AC–HF > Rb–K/AC–HCl > Rb–K/AC. The same sequence was also observed for the amount of the acid surface oxygen groups on AC, but not for the basicity of the catalyst. The key role of acid treatment on AC surface chemistry and the basic sites, which are closely related to catalyst dispersion and basicity, is examined to rationalize these findings. On the other hand, a consideration of the reaction mechanism suggests that the reaction proceeds via CF2 carbenes formed on the catalyst surface as intermediates, followed by carbine disproportionation to CF3 radicals and CF3CF2 radicals, followed by reaction with I2 to produce CF3CF2I, and it was also found that the Rb–K/AC–HCl catalyst with a high dispersion and moderate basicity was helpful for the enhancement of catalytic activity for C2F5I synthesis.
Keywords :
Activated carbon , C2F5I synthesis , Surface oxygen group , Carbine , Acidic treatment
Journal title :
Journal of Fluorine Chemistry
Serial Year :
2011
Journal title :
Journal of Fluorine Chemistry
Record number :
1611311
Link To Document :
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