Title of article
The photochemical stability of collagen–chitosan blends
Author/Authors
Sionkowska، نويسنده , , A and Wisniewski، نويسنده , , M and Skopinska، نويسنده , , J and Kennedy، نويسنده , , C.J and Wess، نويسنده , , T.J، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2004
Pages
10
From page
545
To page
554
Abstract
The photochemical stability of collagen–chitosan blends in solution and film form was investigated using viscosimetry measurements, UV-Vis spectrophotometry, FTIR spectroscopy and wide angle X-ray diffraction. It was found that the relative viscosity of collagen decreased upon UV irradiation. The initial relative viscosity of collagen–chitosan blends were greater than the viscosity of collagen; upon UV irradiation the viscosity of the blends decreased rapidly. The absorption/scattering of collagen in solution increased during irradiation of the sample as shown by UV-Vis, indicating a conformational transition in the sample. FTIR showed that the amide A, B, I and II bands from collagen are shifted after UV irradiation to lower wave numbers; these shifts in collagen–chitosan blends are less well pronounced. Wide angle X-ray diffraction indicated that collagen and collagen–chitosan blends in film form retain much of their structural characteristics after irradiation.
scosimetry and UV-Vis spectrophotometry results have shown that solutions of collagen–chitosan blends are less stable photochemically than a pure collagen solution. FTIR spectra have shown, that collagen–chitosan blended films are also less stable photochemically than pure collagen films. Wide angle X-ray diffraction indicates that collagen and collagen–chitosan blend samples in film form are less susceptible to conformational change than equivalent samples in solution.
Keywords
UV radiation , Chitosan , Collagen , X-ray diffraction , structure
Journal title
Journal of Photochemistry and Photobiology:A:Chemistry
Serial Year
2004
Journal title
Journal of Photochemistry and Photobiology:A:Chemistry
Record number
1613656
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