Title of article :
The photochemical stability of collagen–chitosan blends
Author/Authors :
Sionkowska، نويسنده , , A and Wisniewski، نويسنده , , M and Skopinska، نويسنده , , J and Kennedy، نويسنده , , C.J and Wess، نويسنده , , T.J، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2004
Abstract :
The photochemical stability of collagen–chitosan blends in solution and film form was investigated using viscosimetry measurements, UV-Vis spectrophotometry, FTIR spectroscopy and wide angle X-ray diffraction. It was found that the relative viscosity of collagen decreased upon UV irradiation. The initial relative viscosity of collagen–chitosan blends were greater than the viscosity of collagen; upon UV irradiation the viscosity of the blends decreased rapidly. The absorption/scattering of collagen in solution increased during irradiation of the sample as shown by UV-Vis, indicating a conformational transition in the sample. FTIR showed that the amide A, B, I and II bands from collagen are shifted after UV irradiation to lower wave numbers; these shifts in collagen–chitosan blends are less well pronounced. Wide angle X-ray diffraction indicated that collagen and collagen–chitosan blends in film form retain much of their structural characteristics after irradiation.
scosimetry and UV-Vis spectrophotometry results have shown that solutions of collagen–chitosan blends are less stable photochemically than a pure collagen solution. FTIR spectra have shown, that collagen–chitosan blended films are also less stable photochemically than pure collagen films. Wide angle X-ray diffraction indicates that collagen and collagen–chitosan blend samples in film form are less susceptible to conformational change than equivalent samples in solution.
Keywords :
UV radiation , Chitosan , Collagen , X-ray diffraction , structure
Journal title :
Journal of Photochemistry and Photobiology:A:Chemistry
Journal title :
Journal of Photochemistry and Photobiology:A:Chemistry