Ultra-violet light activated photocatalysis in thin films of the titanium oxynitride, Ti3−δO4N

A film of the recently reported material Ti3−δO4N has been shown to be more photocatalytically active than a comparable film of TiO2. The photocatalytic ability was determined using the stearic acid degradation test with 254 nm UV light. Both films were made using atmospheric pressure chemical vapour deposition (APCVD) at 630 °C from titanium (IV) chloride and ethyl acetate, with the oxynitride additionally using ammonia as a nitrogen source. The films were characterised by XRD and spectroscopic methods. The Raman pattern of Ti3−δO4N is also reported here for the first time.