Effects of Ar–H2–N2 microwave plasma on chitosan and its nanoliposomes blend thin films designed for tissue engineering applications

This work addresses the functionalization of chitosan thin films and its nanoliposomes blend films by a microwave-excited Ar/N2/H2 surface-wave plasma treatment which was found an effective tool to modify surface properties. Changes in the film properties (wettability, chemical composition, morphology) induced by the plasma treatment are studied using water contact angle measurements, X-ray photoelectron spectroscopy and scanning probe microscopy. The results suggest that hydrophilicity of the films is improved by plasma treatment in a plasma condition dependency manner. Water contact angle of chitosan films before and after plasma treatment are, respectively, 101° and 27°. Besides chemical changes on the surface, the nanoliposomes incorporation and plasma treatment also induce morphological modifications. Moreover, a correlation is found between the nanoliposomes composition and size, and the effects of plasma treatment. It is shown that the plasma treatment significantly improves the chitosan film functionalization. The effect of N2 content (88% and 100%) in the plasma gas mixture on the film etching is also pointed out.