Title of article :
Radical-based reduction of phosphine sulfides and phosphine selenides by (Me3Si)3SiH
Author/Authors :
Romeo، نويسنده , , Roberto and Wozniak، نويسنده , , Lucyna A and Chatgilialoglu، نويسنده , , Chryssostomos، نويسنده ,
Issue Information :
هفته نامه با شماره پیاپی سال 2000
Abstract :
Tris(trimethylsilyl)silane reacts with phosphine sulfides and phosphine selenides under free radical conditions to give the corresponding phosphines in good yields. Stereochemical studies on P-chiral phosphine sulfides show these reductions proceed with retention of configuration.
Keywords :
Phosphine sulfides , Reduction , radical reactions
Journal title :
Tetrahedron Letters
Journal title :
Tetrahedron Letters
