Title of article :
Ellipsometric and microwave reflectivity studies of current oscillations during anodic dissolution of p-Si in fluoride solutions
Author/Authors :
Bِhm، نويسنده , , S. and Peter، نويسنده , , L.M. and Schlichthِrl، نويسنده , , Mathieu H. G. de Greef، نويسنده , , R.، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2001
Pages :
7
From page :
178
To page :
184
Abstract :
Periodic current oscillations during anodic dissolution of monocrystalline p-Si(100) in buffered ammonium fluoride solutions (0.1 mol dm−3 fluoride, pH 4.5) were investigated using a flow cell in order to eliminate mass transport limitations. The flow cell was designed to permit simultaneous in-situ ellipsometry, impedance and potential modulated microwave reflectivity measurements. Analysis of the ellipsometric response showed that the current oscillations are accompanied by a synchronous variation of the overall oxide thickness with an amplitude of 4.5±0.1 nm. Analysis of the relationship between the total oxide thickness and the current during the oscillation cycle shows that to a first approximation the rate of chemical dissolution of anodic oxide remains constant. Oscillations of the electrode admittance and potential modulated microwave reflectivity were also measured. The imaginary component of the admittance is related to the oscillation in thickness of a narrow inner region of ‘dry’ oxide and to changes in the accumulation capacitance. The oscillation in the potential modulated microwave reflectivity is interpreted in terms of the changes in the density of holes accumulated at the p-Si ∣ SiO2 interface.
Keywords :
Silicon , fluoride , microwave , Etching , Oscillations , ellipsometry
Journal title :
Journal of Electroanalytical Chemistry
Serial Year :
2001
Journal title :
Journal of Electroanalytical Chemistry
Record number :
1664103
Link To Document :
بازگشت