Title of article :
Repair of Pd-based composite membrane by polishing treatment
Author/Authors :
Ryi، نويسنده , , Shin-Kun and Park، نويسنده , , Jong-Soo and Hwang، نويسنده , , Kyung-Ran and Lee، نويسنده , , Chun-Boo and Lee، نويسنده , , Seong-Wook، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2011
Pages :
5
From page :
13776
To page :
13780
Abstract :
In this study, polishing treatment was introduced to repair Pd-based composite membrane. Some pinholes remained after sputtering with palladium followed by heat-treatment at 723 K for 2 h. The pinholes drastically decreased the hydrogen perm-selectivity of the Pd-based composite membrane. In order to remove the pinholes, we introduced polishing treatment after the palladium sputtering. Scanning election microscopy (SEM) analysis and helium leak tests confirmed the effectiveness of the polishing treatment in removing the pinholes. The helium leaks were drastically decreased by the polishing treatment. Hydrogen permeation and helium leak tests showed that the polishing treatment increased the hydrogen perm-selectivity from 52 to >40,000 with a hydrogen permeation flux of 1.8 × 10−1 mol m−2 s−1 at a pressure difference of 100 kPa and temperature of 673 K. vantage of our membrane fabrication procedures lies in its simplicity. Our coating and polishing method offers the promise of highly reproducible Pd-based composite membrane.
Keywords :
Hydrogen , Pd membrane , sputtering , Polishing , Separation
Journal title :
International Journal of Hydrogen Energy
Serial Year :
2011
Journal title :
International Journal of Hydrogen Energy
Record number :
1668013
Link To Document :
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