Title of article
Hydrogen insertion in metals: the mechanism and effect of recombination of ad-atoms
Author/Authors
Vigdorovich، نويسنده , , Michael V. and Vigdorovich، نويسنده , , Vladimir I.، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2004
Pages
7
From page
351
To page
357
Abstract
The model for hydrogen evolution reaction via a Volmer–Tafel mechanism has been considered, in which a recombination stage was represented as a set of successive and contemporary reactions. The solution of the respective kinetic equation has been obtained for the steady-state regime, which enables us to analyze the balance of the surface processes affecting the metal hydrogenation. It is demonstrated that the diffusing hydrogen flux into the metal bulk is weaker in the case of surfaces with greater concentration of adsorption centres and weaker bond energy between the active centres and hydrogen atoms.
Keywords
Hydrogen evolution , Insertion , surface , diffusion , POTENTIAL
Journal title
Journal of Electroanalytical Chemistry
Serial Year
2004
Journal title
Journal of Electroanalytical Chemistry
Record number
1670124
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