Title of article :
Atomic-hydrogen-induced self-organization of Si(111)√3×√3-In surface phase studied by CAICISS and STM
Author/Authors :
Ryu، نويسنده , , J.T. and Kubo، نويسنده , , O. and Fujino، نويسنده , , T. and Fuse، نويسنده , , T. and Harada، نويسنده , , T. and Kawamoto، نويسنده , , K. and Katayama، نويسنده , , M. and Saranin، نويسنده , , A.A. and Zotov، نويسنده , , A.V. and Oura، نويسنده , , K.، نويسنده ,
Issue Information :
هفته نامه با شماره پیاپی سال 2000
Pages :
9
From page :
117
To page :
125
Abstract :
Using coaxial impact collision ion scattering spectroscopy (CAICISS), scanning tunneling microscopy (STM), and low-energy electron diffraction (LEED) techniques, we have investigated the interaction of atomic hydrogen with the Si(111)√3×√3-In surface phase at elevated temperatures and structural behavior of In clusters induced by the interaction. Upon atomic hydrogen interaction, SiIn bonds are broken and replaced by SiH bonds. As a result, the √3×√3 reconstruction is destroyed and small In clusters are formed on hydrogen-terminated Si(111)1×1 surface. Using STM, we also have found that the size of the In cluster increases with increasing substrate temperature during hydrogen exposure of the √3×√3-In surface phase. From CAICISS experimental results, we have found that atomic-hydrogen-induced In clusters for Si(111)√3×√3-In surface phase have an In(100) crystalline structure, while those for Si(001)4×3-In surface phase are polycrystalline. In conclusion, we have found that structural differences of surface give rise to different atomic-hydrogen-induced self-organization.
Keywords :
hydrogen atom , Ion scattering spectroscopy , Scanning tunneling microscopy , morphology , Roughness , and topography , surface structure , Indium , Surface chemical reaction , Silicon , Low energy ion scattering (LEIS)
Journal title :
Surface Science
Serial Year :
2000
Journal title :
Surface Science
Record number :
1677746
Link To Document :
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