Title of article :
Ligand lability of triethylgallium on GaAs(100)
Author/Authors :
McEllistrem، نويسنده , , Marcus T. and Jackson، نويسنده , , Michael S. and Culp، نويسنده , , Robert D. and Ekerdt، نويسنده , , John G.، نويسنده ,
Issue Information :
هفته نامه با شماره پیاپی سال 2000
Pages :
14
From page :
117
To page :
130
Abstract :
We report direct evidence for dissociative adsorption and recombinative desorption of triethylgallium on GaAs(100). Deuterated and undeuterated triethylgallium were used to investigate two distinct ethyl species produced by chemisorption of triethylgallium on GaAs(100): ethyl ligands bound to the GaAs surface and those in chemisorbed ethylgallium species. Deuterium labeling verified that chemisorbed ethyl ligands exchange at temperatures as low as 205 K, for which the GaAs surface serves as an intermediate adsorption site. Ligand exchange was also observed for physisorbed multilayers of triethylgallium for temperatures at or below 180 K. Ligand labeling experiments were also used to demonstrate that following dissociative adsorption, diethylgallium is the only adsorbed ethylgallium species that can lead to recombinative desorption; decomposition of adsorbed diethylgallium prohibits recombinative desorption. Rapid and continuous ligand exchange on the GaAs surface and walls of the vacuum chamber at temperatures of 300 K and above was also observed.
Keywords :
Gallium arsenide , Thermal desorption spectroscopy , Chemisorption , Surface chemical reaction , Low index single crystal surfaces , Isotopic exchange/traces , Single crystal surfaces
Journal title :
Surface Science
Serial Year :
2000
Journal title :
Surface Science
Record number :
1677829
Link To Document :
بازگشت