Title of article :
X-ray excitation of DX centers in Si-doped Al0.35Ga0.65As
Author/Authors :
Soh، نويسنده , , Yeong-Ah and Aeppli، نويسنده , , Mark G. and Zimmermann، نويسنده , , Frank M. and Isaacs، نويسنده , , E.D. and Frenkel، نويسنده , , Anatoly I.، نويسنده ,
Issue Information :
هفته نامه با شماره پیاپی سال 2000
Abstract :
We report on the use of X-rays to excite DX centers in Si doped Al0.35Ga0.65As into their shallow donor state, as monitored by measuring the resulting persistent photoconductivity. The energy dependence of the photoconductivity closely follows the simultaneously detected X-ray fluorescence, indicating that photoexcitation of core holes is an efficient primary excitation step for the excitation of DX centers. However, there is no appreciable difference between the Ga and As K-edges, implying a non-local DX center excitation mechanism.
Keywords :
Gallium arsenide , Electrical transport measurements , Semiconducting films , X-ray absorption spectroscopy , photoconductivity
Journal title :
Surface Science
Journal title :
Surface Science